Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing
Patent
1988-03-07
1990-06-26
Stoll, Robert L.
Chemistry of inorganic compounds
Oxygen or compound thereof
Metal containing
423266, 423275, 423593, 423608, 423610, 423612, 423613, 423615, 423625, 423614, 423628, 423631, 55 87, 252307, 252309, 252350, 156 77, C01B 1318
Patent
active
049370626
ABSTRACT:
The present invention includes metal oxide foam particles and a method of making the same. A decomposable metal salt feed solution is injected into a hot atomizing gas. The mixture of hot atomizing gas and feed solution is maintained in the reactor until the feed solution converts to metal oxide foam particles. The metal oxide foam particles have a high specific surface area.
REFERENCES:
patent: 3161468 (1964-12-01), Walsh
patent: 3172753 (1965-03-01), Walsh
patent: 3273962 (1966-09-01), Walsh
patent: 3961036 (1976-06-01), Hamner et al.
patent: 4018881 (1977-04-01), Mattox
patent: 4048290 (1977-09-01), Lee
patent: 4179408 (1979-12-01), Sanchez et al.
patent: 4292290 (1981-09-01), Tunison, III
patent: 4331645 (1982-05-01), Dunn, Jr.
patent: 4755373 (1988-07-01), Gherardi et al.
Chemical Abstract, 104:7798r.
Chemical Abstract, 100:72954v.
Derwent Abstract, 85-207313/34.
Derwent Abstract, 83-823964/47.
"Synthesis of Alumina . . . ", Ciminelli, (1983).
"Ultrafine Metal Oxides by Decomposition of Salts in a Flame", Electrochemical Soc. Series, 1963.
Jordan, deceased Merrill
MacKay Bruce E.
Neville Matthew
Reznek Steven R.
Soucy Brian A.
Cabot Corporation
Harvey Paige C.
Honeyman Jason M.
Stoll Robert L.
LandOfFree
High surface area metal oxide foams and method of producing the does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High surface area metal oxide foams and method of producing the , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High surface area metal oxide foams and method of producing the will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1124686