High speed wafer handling method

Details High speed wafer handling method High speed wafer handling method

1991-12-11

1993-01-05

Werner, Frank E.

Material or article handling

Apparatus for moving intersupporting articles into, within,...

Stack forming apparatus

414217, 414416, B65G 6500

Patent

active

051764938

ABSTRACT:
The present invention describes a loading system for high speed loading of wafers, such as semiconductor wafers, into vacuum chambers for various applications such as inspection or processing using, for example, a SEM. This system provides low contamination from atmospheric conditions both on loading and unloading the wafers.

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patent: 4781511 (1988-11-01), Harada et al.
patent: 4861563 (1989-08-01), Shekerjian et al.
patent: 4915564 (1990-04-01), Eror et al.

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