High-speed substrate manipulator

Details High-speed substrate manipulator High-speed substrate manipulator

2011-03-01

2011-03-01

Ro, Bentsu (Department: 2837)

Electricity: motive power systems

Positional servo systems

Program- or pattern-controlled systems

C318S568120, C318S560000, C318S649000

Reexamination Certificate

active

07898204

ABSTRACT:
A mechanism for manipulation of a substrate over a substantially planar region has at least three, and up to six, degrees of freedom (DOF). The mechanism may be manufactured in various configurations, including triangular, and may use inherent symmetry to reduce the number of distinct components that must be manufactured. The mechanism may use parallelism to reduce the moving mass and thereby achieve higher levels of performance using less expensive motors while dissipating less power.

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