High-speed signal transmission line path structure for semicondu

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means

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257659, 257664, H01L 2702, H01L 2348, H01L 2946, H01L 2504

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active

051856506

ABSTRACT:
A high-speed semiconductor integrated circuit device has a main circuit section formed on a substrate, and a capacitance section formed on the substrate to surround the main circuit section. The capacitance section is made up of two conductive layers, an upper layer being insulatively disposed above a lower layer. These layers are applied with a power source voltage and a ground voltage, respectively. High-speed signal lines insulatively traverse the capacitance section and are connected to the main circuit section. The capacitance section is disconnected in the region where each signal transmission line passes, and defines a micro-strip type signal transmission line path structure. A "ladder"-shaped connection pattern is provided at each disconnected portion of the capacitance section, for electrically connecting a conductive layer arranged on one side of the disconnected portion to the corresponding layer arranged on the other side of the disconnected portion. The ladder-shaped connection pattern includes first and second parallel connection portions which extend at right angles to their corresponding signal transmission line. The impedance of the signal transmission line can be controlled by altering the horizontal pattern of the connection portions.

REFERENCES:
patent: 4654689 (1987-03-01), Fuji
patent: 4924290 (1990-05-01), Enkaku et al.
Toshiba Technical Bulletin, vol. 5-9, (Apr. 1987) pp. 123-125.
Patents Abstracts of Japan E-200 Sep. 28, 1983, vol. 7/No. 218--58-111406.

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