High speed shuttle for gating a radiation beam, particularly for

Details High speed shuttle for gating a radiation beam, particularly for High speed shuttle for gating a radiation beam, particularly for

1993-04-30

1994-12-20

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

3542271, 359846, G03B 2772, G02F 100

Patent

active

053749740

ABSTRACT:
Fine, sub-micron line features and patterns are created in a sensitized layer on a semiconductor wafer by a beam of low wavelength radiation, such as X-rays or Gamma-rays. A continuous stream of such radiation is gated on and off by a shutter mechanism comprising a distortable-surface device and a beam-blocking device. The distortable-surface device is a surface acoustic wave device, a magnetostrictive device, or the like. The beam-blocking device is a beam stop, such as a knife edge, an aperture, or the like. The distortable-surface device can be selectively caused to reflect an incident beam of radiation past or into the beam-blocking device. In this manner, a continuous stream of radiation, such as from a pellet of Cobalt-60, can be quickly and precisely gated on and off to impact and to not-impact the semiconductor wafer, respectively. By moving either of the reflected beam or the semiconductor wafer, line features can be created in the sensitized layer on the semiconductor wafer.

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patent: 4025191 (1977-05-01), Seward, III
patent: 5055871 (1991-10-01), Pasch
patent: 5105215 (1992-04-01), Liu
patent: 5139904 (1992-08-01), Auda et al.

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