High speed reticle change system

Details High speed reticle change system High speed reticle change system

1986-11-05

1988-07-26

Hix, L. T.

Photocopying

Projection printing and copying cameras

Methods

G03B 2732

Patent

active

047604298

ABSTRACT:
Method and apparatus are disclosed for speeding up reticle changes during the production of semiconductor wafers under those circumstances wherein three reticles are employed, one (C) having a substantially longer exposure period than the others (A, B). The wafer is exposed to the reticles in the sequence ACB-BCA-ACB, etc.

REFERENCES:
patent: 4530635 (1985-07-01), Engelbrecht et al.
patent: 4664510 (1987-05-01), Weag

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