High speed pump for a processing vacuum chamber

Details High speed pump for a processing vacuum chamber High speed pump for a processing vacuum chamber

1995-02-01

1996-05-28

Capossela, Ronald C.

Refrigeration

Low pressure cold trap process and apparatus

622592, 417901, B01D 800

Patent

active

055200028

ABSTRACT:
A high speed pumping apparatus for efficiently and rapidly evacuating a processing chamber to a desired vacuum pressure includes a pump chamber for coupling to the processing chamber and a cryogenic element in the pump chamber to absorb gas particles. The cryogenic element is movable within the pump chamber and has a first position inside the pump chamber and removed from the processing chamber. When the cryogenic element is in the first position, a sealing structure seals the aperture between the pump chamber and the processing chamber. The cryogenic element is movable, through the aperture, to a second position at least partially out of the pump chamber and inside the processing chamber. When in the second position inside of a processing chamber, the cryogenic element absorbs gas particles within the processing chamber and evacuates the chamber to a vacuum pressure. Thereby, the cryogenic element may be exposed to the processing chamber to evacuate the processing chamber and may subsequently be withdrawn into the pump chamber and sealed therein to be protected when the processing chamber is opened to atmospheric pressure.

REFERENCES:
patent: 2985356 (1961-05-01), Beecher
patent: 3019809 (1962-02-01), Ipsen et al.
patent: 3483709 (1969-12-01), Baicker et al.
patent: 3585807 (1971-06-01), Hengeross et al.
patent: 4072025 (1978-02-01), Thibault
patent: 4438632 (1984-03-01), Lessard et al.
patent: 4803845 (1989-02-01), Strasser et al.
patent: 5062271 (1991-11-01), Okumura et al.
patent: 5345787 (1994-09-01), Pitlingsrud

Affiliated with

Also associated with

Rating

High speed pump for a processing vacuum chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High speed pump for a processing vacuum chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High speed pump for a processing vacuum chamber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-779164