Image analysis – Applications – Manufacturing or product inspection
Patent
1997-07-15
2000-04-25
Boudreau, Leo H.
Image analysis
Applications
Manufacturing or product inspection
382286, 356376, 356387, 25055912, 25055924, G06T 760, G01B 908
Patent
active
060553294
ABSTRACT:
An method and apparatus for determining deviation of characteristics of a sample workpiece from predetermined characteristics of a control workpiece. The apparatus preferably includes an illumination system for producing a collimated beam having substantially parallel rays, a positioning system for placing a sample workpiece between outer edges of the collimated beam so that the sample workpiece partially occludes the collimated beam to produce a silhouette within the collimated beam, an imaging apparatus oriented normal to said collimated beam and including a plurality of discrete light sensing elements for producing pixel data representative of an image including the silhouette, and a processor for determining deviation of characteristics of the sample workpiece from predetermined characteristics of a control workpiece using the pixel data according to pixel data representative of a diffraction band generated through interaction of the sample workpiece and the collimated beam. A preprocessor for preprocessing the pixel data to compensate for imaging defects and for normalizing the diffraction band may also be included.
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Boudreau Leo H.
Sherikon, Inc.
Werner Brian P.
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