Coating apparatus – Gas or vapor deposition – Work support
Patent
1990-07-10
1992-03-24
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Work support
118718, 118719, 118720, 118724, 118726, 427 35, 427 42, 427 44, 427 81, 427251, 4272555, 4272556, 4272557, C23C 1644
Patent
active
050978004
ABSTRACT:
A high speed apparatus for forming capacitors includes a vacuum chamber in which is located a carrier defining a continuous surface configured to move at a rate of from about 150 feet per minute to about 600 feet per minute during the forming operation, a metal depositing device, a dielectric depositing device, and a radiation source. The metal depositing device is configured to deposit layers of metal onto the moving surface, and the dielectric depositing device includes (a) a device for atomizing a radiation-curable polyfunctional acrylic monomer to form liquid droplets of the monomer, (b) a heated surface on which the atomized monomer droplets impinge and are flash vaporized, and (c) device for thereafter condensing the flash-vaporized monomer on the metal layers to form a monomer coating on successive layers. The radiation source is positioned for curing successive monomer coatings after each such coating has been deposited, to thereby form a polymer dielectric layer. Apparatus are provided for controlling each of the devices so that metal is deposited, a monomer coating is deposited, and the monomer coating is cured to form the polymer dielectric layer before the continuous surface passes the devices again for successive metal layers, monomer coatings, and curings.
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Ham Mooyoung
Shaw David G.
Strycker Donald S.
Yializis Angelo
Beck Shrive
Owens Terry J.
Spectrum Control Inc.
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