High silica glass

Details High silica glass High silica glass

1981-04-23

1982-07-20

Schor, Kenneth M.

Glass manufacturing

Processes

With chemically reactive treatment of glass preform

65 6051, C03C 1500, C03C 306

Patent

active

043404081

ABSTRACT:
A fully dense high silica glass is made by taking a silica glass, causing it to phase separate into two inter-connecting phases, then removing one phase to leave a porous high silica glass, forming a layer of metal oxide over the surface of the pores of the glass and finally sintering the metal oxide-coated porous glass. Preferably a titanium oxide layer is formed by first producing a layer of titanium chloride and then hydrolysing this layer to form a surface layer of titanium oxide. The formation of a metal oxide layer on the pores of the glass allows a lower process temperature to be used, for sintering and providing the fully dense high silica glass.

REFERENCES:
patent: 1918117 (1933-07-01), Martin
patent: 3113008 (1963-12-01), Elmer
patent: 3262767 (1966-07-01), Wang
patent: 3438803 (1969-04-01), Dubble et al.
patent: 3459522 (1969-08-01), Elmer et al.
patent: 3785793 (1974-01-01), Park
patent: 3952118 (1976-04-01), Novice
patent: 4165222 (1979-08-01), Panafieu et al.
patent: 4261722 (1981-04-01), Novak et al.

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