High sensitivity mid and deep UV resist

Details High sensitivity mid and deep UV resist High sensitivity mid and deep UV resist

1989-07-06

1990-07-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430191, 430193, 430326, G03C 160

Patent

active

049435116

ABSTRACT:
Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a novolak resin selected from resins prepared from a phenolic component having a high p-cresol content or from a mixture of formaldehyde and an aromatic aldehyde.

REFERENCES:
patent: 3201239 (1965-08-01), Neugebauer et al.
patent: 4059449 (1977-11-01), Rosenkranz et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4499171 (1985-02-01), Hosaka et al.
patent: 4529682 (1985-07-01), Toukhy

Affiliated with

Also associated with

Rating

High sensitivity mid and deep UV resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High sensitivity mid and deep UV resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High sensitivity mid and deep UV resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1267467