High-sensitivity instrument to measure NVR in fluids

Measuring and testing – Gas analysis – By vibration

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73 3106, 310313R, 310313D, H03H 925, G01N 2902, G01N 2922

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active

059182580

ABSTRACT:
A real time nonvolatile residue (NVR) monitor operates to efficiently detect molecular contamination in a given environment. The present NVR monitor utilizes surface acoustic wave (SAW) resonators in a controlled environment which efficiently promotes deposition of NVR on the sensor surface. The SAW resonators preferably operate at a resonant frequency of approximately 200 MHz-2,000 MHz which enables the NVR monitor to detect molecular contamination on the order of 10.sup.-11 g-cm.sup.-2 to 10.sup.-13 g-cm.sup.-2. The NVR monitor utilizes active temperature control of (SAW) resonators to achieve a stable resonant frequency and to thermally separate NVR from a sample fluid contacting the SAW. The temperature control system of the NVR monitor is able to directly heat and cool the SAW resonators utilizing a thermoelectric element to maintain the resonators at a preset temperature in accordance with optimal environmental conditions for separating NVR from the sample fluid. The sample fluid, comprising a carrier fluid and NVR, is furthermore processed to provide conditions, such as pre-cooling and/or pressurization, which enhance condensation of NVR on the sensor surface. Increasing the collection efficiency allows the NVR monitor to operate faster at a desired level of accuracy and provides more quantitative information for trace contaminant analysis.

REFERENCES:
patent: 3715911 (1973-02-01), Chuan
patent: 3915645 (1975-10-01), Funke et al.
patent: 4307356 (1981-12-01), Arai
patent: 4312228 (1982-01-01), Wohltjen
patent: 4518944 (1985-05-01), Faris
patent: 4561286 (1985-12-01), Sekler et al.
patent: 4596697 (1986-06-01), Ballato
patent: 4599532 (1986-07-01), Okamoto et al.
patent: 4683394 (1987-07-01), Koshino
patent: 4759210 (1988-07-01), Wohltjen
patent: 4792939 (1988-12-01), Hikita et al.
patent: 4895017 (1990-01-01), Pyke et al.
patent: 4917499 (1990-04-01), Champetier et al.
patent: 4932255 (1990-06-01), Brace et al.
patent: 5012668 (1991-05-01), Haworth
patent: 5042288 (1991-08-01), Vig
patent: 5076094 (1991-12-01), Frye et al.
patent: 5117146 (1992-05-01), Martin et al.
patent: 5138869 (1992-08-01), Tom
patent: 5175711 (1992-12-01), Shiba et al.
patent: 5194830 (1993-03-01), Fleischmann
patent: 5221871 (1993-06-01), Fuchs et al.
patent: 5223762 (1993-06-01), Masaie et al.
patent: 5243539 (1993-09-01), Holt et al.
patent: 5289715 (1994-03-01), Staples et al.
patent: 5325704 (1994-07-01), Mariani et al.
patent: 5325705 (1994-07-01), Tom
patent: 5465608 (1995-11-01), Lokshin et al.
patent: 5469369 (1995-11-01), Rose-Pehrsson et al.
patent: 5476002 (1995-12-01), Bowers et al.
patent: 5550062 (1996-08-01), Wohltjen et al.
Charles Evans & Associates Brochure, Time-of-Flight Secondary Ion Mass Spectrometer.
Reprint from Ultrapure Water Journal, Jul./Aug., 1994, The Measurement of Nonvolatile Residue in High-Purity Water and Clean Liquids.
Particle Measuring Systems, Inc. Brochure, LiquiTrak Nonvolatile Residue Monitors.
The International Society for Optical Engineering, Optical System Contamination: Effects, Measurement, Control III, Jul. 23-24, 1992.
American Institute of Physics, A 200 MHz Surface Acoustic Wave Resonator Mass Microbalance, Feb, 4, 1991.
American Institute of Physics, Surface Acoustic-Wave Piezoelectric Crystal Aerosol Mass Microbalance, Apr. 3, 1989.
National Aeronautics and Space Administration, KSC Payload Facility Contamination Control Requirements/Plan, Nov., 1987.
Elsevier Sequoia, Mechanism of Operation and Design Considerations for Surface Acoustic Wave Device Vapour Sensors, May 21, 1994.
Journal of Spacecraft and Rockets, vol. 17, No. 2, Miniature Quartz Crystal Microbalance for Contamination Measurement, Mar.-Apr., 1990.
Analytical Chemistry, vol. 51, No. 9, Aug., 1979, Surface Acoustic Wave Probes for Chemical Analysis. III. Thermomechanical Polymer Analyzer.
Analytical Chemistry, vol. 51, No. 9, Aug., 1979, Surface Acoustic Wave Probes for Chemical Analysis. II. Gas Chromatograph Detector.
Analytical Chemistry, vol. 51, No. 9, Aug., 1979, Surface Acoustic Wave Probe for Chemical Analysis. I. Introduction and Instrument Description.
Applied Physics Letters, vol. 7, No. 12, Dec. 15, 1995, Direct Piezoelectric Coupling to Surface Elastic Waves.
Education for Technical Excellence, Annual Technical Meeting, May 1-6, 1994, Real-Time SAW Measurements of NVR in Cleanroom and in Microenironment.
NASA Technical Memorandum, 1993, Research and Technology 1993 Annual Report.
Howard W. Sams & Company, Modern Dictionary of Electronics, Sixth Edition.
Reprint from Instruments & Control Systems, Testing Small Orifices, James M. Benson, Charles E. Hawk, Hastings-Raydist, Inc.

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