High selectivity colloidal silica slurry

Details High selectivity colloidal silica slurry High selectivity colloidal silica slurry

2005-11-15

2005-11-15

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S037000, C438S692000, C252S079100

Reexamination Certificate

active

06964600

ABSTRACT:
Provided is a novel high selectivity aqueous slurry composition method of utilizing same. The composition includes non-modified silica based abrasive particles in an amount of about 5 to about 50 weight percent, and an organic compound in an amount of about 0.001 to about 2.0 weight percent in an aqueous solution, wherein the silicon oxide to silicon nitride selectivity ratio ranges from about 50 to about 700.

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