Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1983-01-19
1984-06-12
Bowers, Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430966, 430967, G03F 900, G03F 100
Patent
active
044542097
ABSTRACT:
A lithographic process utilizing soft x-rays or ions to achieve high resolution is disclosed. The process is particularly useful and semiconductor processing where high resolution is required to achieve a high density. The process utilizes a mask to selectively expose a photoresist to soft x-rays of flood beams of ions. The mask comprises a thin metallic foil supported by a frame such that the foil is in tension. The frame includes optical alignment keys. A second patterned layer of metal is affixed to the foil to form areas which are non-transparent to the soft x-rays or flood ion beams for delineating the elements of a semiconductor circuit, for example. This permits the mask to be optically aligned using conventionally techniques with high resolution being achieved due to the short wavelength of the x-ray radiation or the ion beams.
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Maydan, et al., IEEE Transactions on Electron Devices, vol. ED, No. 7, 7/1975, pp. 429-433.
Anon, Electronics, 8/31/78, pp. 117-121.
Bowers Charles L.
Hinson J. B.
Westinghouse Electric Corp.
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