High resolution replicas

Details High resolution replicas High resolution replicas

1988-07-08

1990-11-06

Seidel, Richard K.

Metal founding

Process

Disposition of a gaseous or projected particulate molten...

427 4, 427250, B22D 2300

Patent

active

049678256

ABSTRACT:
Disclosed are improved methods for preparing high resolution replicas for electron microscopic analysis. Replicas are prepared having a resolution capability less than ten angstroms, with structures of even less than five angstroms being readily discernible. Particular aspects of the invention concern the use of a platinum/carbon evaporant to prepare extremely thin replica surfaces which allow the visualization of structures heretofore unresolvable. The replication is performed at high vacuum, on the order of 10.sup.-5 Torr or better, with continuous rotation of the sample to allow for an even distribution of the evaporant. The resultant replica surfaces are on the order of no more than 5 to 10 angstroms thick. The replica technology disclosed herein is applicable to both biological as well as non-biological samples, including tissues, biochemicals, metals and polymers and even computer chips and superconductor surfaces.

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Pickhardt, Vincent, "Fabrication of High-Strength Unsupported Metal Membranes", J. Vac. Sci. Technol., vol. 14, No. 3, (May/Jun. 1977), pp. 823-825.

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