High resolution positive acting dry film photoresist

Details High resolution positive acting dry film photoresist High resolution positive acting dry film photoresist

1997-08-13

1999-11-09

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 4302701, 4302771, 430199, G03F 7023

Patent

active

059811358

ABSTRACT:
A positive acting photoresist composition (e.g., a monolayer dry film) which is strippable in aqueous alkaline solution comprises a photo acid generator and a UV-transparent resin binder system which allows efficient photo bleaching of the photoactive component. An acid functional cellulosic resin may be the only binder resin, an acidic acrylate resin being optional. The dry coating is flexible and may be used as an etch and plating resist.

REFERENCES:
patent: 3744073 (1973-07-01), Loprest et al.
patent: 3778270 (1973-12-01), Roos
patent: 4177073 (1979-12-01), Hata et al.

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