High-resolution photosensitive composition which can be develope

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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G03C 171, G03C 170, G03C 168

Patent

active

047419865

ABSTRACT:
A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example ##STR1##

REFERENCES:
patent: 4197133 (1980-04-01), Zweifel et al.
patent: 4205153 (1980-05-01), Weinstein
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4468447 (1984-08-01), Kanai

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