Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1986-06-16
1988-05-03
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
G03C 171, G03C 170, G03C 168
Patent
active
047419865
ABSTRACT:
A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example ##STR1##
REFERENCES:
patent: 4197133 (1980-04-01), Zweifel et al.
patent: 4205153 (1980-05-01), Weinstein
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4468447 (1984-08-01), Kanai
Collet Andre
Gourrier Serge
Maurin Olivier
Michl Paul R.
Spain Norman N.
Stevenson Terri
U.S. Philips Corp.
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