High resolution photoconductive array and process for fabricatin

Details High resolution photoconductive array and process for fabricatin High resolution photoconductive array and process for fabricatin

1975-04-14

1976-07-06

La Roche, Eugene

Radiant energy

Photocells; circuits and apparatus

Photocell controlled circuit

29572, 250212, 250578, 338 17, 338 18, H01L 3108

Patent

active

039683605

ABSTRACT:
Disclosed is a novel photoconductive array suitable for use as an infrared detector, and a novel process for fabricating same. In this process, a chosen metallization pattern is disposited on the surface of an insulating substrate, and thereafter the metallization pattern is either covered or partially covered with a layer of selected photoconductive material, such as lead selenide or lead sulfide. The photoconductive material is formed into a predetermined pattern which is accomplished using conventional photoetch techniques. Then, a suitable photoresist mask is deposited at a selected location on the surface of the photoconductive layer in preparation for an electroplating step. In this electroplating step, a surface contact metallization for the photoconductor is plated on both the previously deposited photoconductive and metal surfaces which are not masked by the photoresist. This electroplated contact metallization for the photoconductor exhibits excellent adherence to the somewhat rough surface of the photoconductive material, and the present process exhibits an improved geometry reduction capability relative to prior art processes.

REFERENCES:
patent: 2884508 (1959-04-01), Czipott et al.
patent: 3634424 (1972-01-01), Golubovic

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