Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2005-07-19
2005-07-19
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S022000, C101S130000, C101S131000, C101SDIG029, C396S428000
Reexamination Certificate
active
06919152
ABSTRACT:
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
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Bailey Todd
Choi Byung J.
Colburn Matthew
Sreenivasan S. V.
Board of Regents , The University of Texas System
Brooks Kenneth C.
Young Christopher G.
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