High resolution optical microscope and irradiation spot beam-for

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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250237R, 359370, H01J 314

Patent

active

052910121

ABSTRACT:
A high resolution optical microscope consists of an irradiation spot beam-forming mask which is disposed in a dark or a bright field, whereby a diameter of each of a plurality of irradiation spot beams onto an object to be measured is made smaller than a size of the object, beyond Rayleigh's resolution limit. In the irradiation spot beam-forming mask, a phase array is regularly disposed in a two-dimensional direction so that neighboring portions of each of the irradiation spot beams are optically phase-shifted from one another at 180.degree.. Thus, a wide observation surface and a prompt measurement can be performed with a high resolution of 0.1 .mu.m or less, far beyond Rayleigh's resolution limit.

REFERENCES:
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patent: 4631416 (1986-12-01), Trutna, Sr.
patent: 4929083 (1990-05-01), Brunner
patent: 5086222 (1992-02-01), Shibuya
"Wave Optics", by Hiroshi Kubota, Iwanami Shoten, 1971, pp. 360-363.
Satoshi Okazaki, O plus E, "Development of a Fluorescent Method of Near-Field Scanning Optical Microscope and Trial of Application to Bio-observation", No. 118, Sep. 1989.

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