High resolution optical lithography method and apparatus having

Details High resolution optical lithography method and apparatus having High resolution optical lithography method and apparatus having

1983-06-07

1984-07-10

Gellner, Michael L.

G03B 4100

Patent

active

044589948

ABSTRACT:
An optical lithography method and apparatus in which a pulsed excimer laser produces at least one fundamental output which is directed to expose a photosensitive medium. The output is highly non-gaussian and has sufficient power so that full exposures can be accomplished within a few seconds. An alternate light source is provided by directing the excimer laser output to a Raman cell having a suitable Raman medium contained therein. At least one secondary wavelength is produced by stimulated Raman scattering and the output of the Raman cell is directed to expose a photosensitive medium. A mixture of more than one excimer gas can also be provided in the excimer laser to produce one fundamental output for each excimer gas present in the mixture. These outputs can be directed to expose a photosensitive medium directly. Alternatively, these outputs can be directed to a Raman cell having either a single Raman medium or multiple Raman media in a suitable mixture and directing the output from the Raman cell to expose the photosensitive medium.

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"Coherent Radiation Generation at Short Wavelengths", D. J. Bradley, from High Power Lasers & Applications, Eds. K. L. Kompa & H. Walther, Springer, 1978, pp. 9-18.

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