High resolution observation apparatus with photon scanning micro

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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25022711, 250306, H01J 314

Patent

active

053047958

ABSTRACT:
A high resolution observation apparatus of material features with a photon scanning microscope. The apparatus detects evanescent light which depends on surface feature of a sample and detects detailed distribution of optical constants of the sample. Namely, the apparatus makes it possible to detect detailed distribution of transparency or refractive index within a sample material in higher resolution than the wavelength of the incident light which is irradiates to the sample material coated on the top surface of the optical prism. The apparatus includes means for maintaining a predetermined distance between the sample and an optical fiber tip or means for detecting a positioning signal. Further, it becomes possible to detect fluorescent condition of the sample.

REFERENCES:
patent: 5018865 (1991-05-01), Ferrell et al.
Durig, et al., "Near-field Optical Scanning Microscopy with Tunnel-Distance Regulation", IBM Journal of Research and Development, vol. 30, No. 5, Sep. 1986, NY, pp. 478-480.
Betzig, et al., "Combined Shear Force and Near-field Scanning Optical Microscopy", Applied Physics Letters, vol. 60, No. 20, May 18, 1992, NY, pp. 2484-2486.
Toledo-Crow, et al., "Near-field Differential Scanning Optical Microscope With Atomic Force Regulation", Applied Physics Letters, vol. 60, No. 24, Jun. 15, 1992, NY, pp. 2957-2959.

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