High resolution matrix lens electron optical system

Radiant energy – With charged particle beam deflection or focussing – With target means

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Details

250396R, 313431, G01K 108

Patent

active

040977455

ABSTRACT:
A high resolution matrix lens electron optical system utilizes a relatively short focal length matrix lens, means for providing an axial magnetic field and electrostatic deflection means for both coarse and fine deflection operation in conjunction with the axial magnetic field to provide reduced cathode loading and minimal spherical aberration.

REFERENCES:
patent: 3371206 (1968-02-01), Takizawa
patent: 3651303 (1972-03-01), Rehme
patent: 3876883 (1975-04-01), Broers
patent: 3936693 (1976-02-01), Parks et al.

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