High resolution mask and method of fabrication thereof

Details High resolution mask and method of fabrication thereof High resolution mask and method of fabrication thereof

1980-01-17

1981-08-18

Herbert, Jr., Thomas J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

427 431, 427261, 427264, 427270, 427271, 428209, 428332, 428337, 428913, B32B 300, B32B 2700, B05D 306

Patent

active

042846781

ABSTRACT:
There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a relatively thin membrane of suitable density and material to be substantially transparent to various types of radiation such as, but not limited to, E-beams, x-rays and the like. A pattern of material which is substantially opaque to the same radiation is provided on the membrane. To the extent necessary, a suitable auxiliary support member is attached to the membrane for supporting same.

REFERENCES:
patent: 3916056 (1975-10-01), Feldstein
patent: 3962004 (1976-06-01), Sonneborn
patent: 3985597 (1976-10-01), Zielinski
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4057831 (1977-11-01), Jacobs et al.
M. B. Heritage et al., Electrochemical Soc. Spring Meeting, paper intitled "A Solution to the Mask Stencel Problem and Electron Projection Microfabrication", May 7, 1976.

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