Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1983-04-10
1985-12-10
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 5, 430311, 430966, 430967, G03F 900, G03F 100, G03F 726
Patent
active
045579865
ABSTRACT:
A lithographic process utilizing soft x-rays or ions to achieve high resolution is disclosed. The process is particularly useful and semiconductor processing where high resolution is required to achieve a high density. The process utilizes a mask to selectively expose a photoresist to soft x-rays or flood beams of ions. The mask comprises a thin metallic foil supported by a frame such that the foil is in tension. The frame includes optical alignment keys. A second patterned layer of metal is affixed to the foil to form areas which are nontransparent to the soft x-rays or flood ion beams for delineating the elements of a semiconductor circuit, for example. This permits the mask to be optically aligned using conventionally techniques with high resolution being achieved do to the short wavelength of the x-ray radiation or the ion beams.
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Bowers Jr. Charles L.
Hinson J. B.
Westinghouse Electric Corp.
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