High-resolution high-apertured objective

Details High-resolution high-apertured objective High-resolution high-apertured objective

1997-04-25

1999-03-09

Epps, Georgia

Optical: systems and elements

Lens

With field curvature shaping

359661, 359726, 359639, G02B 300, G02B 2102, G02B 1700, G02B 2712

Patent

active

058808914

ABSTRACT:
The invention is directed to a high-resolution high-apertured objective which includes an object plane (1); a first lens group (LG1); a second lens group (LG2) downstream of the first lens group; a beamsplitter (17, 18, 22, P) downstream of the second lens group; a concave mirror (21); a system diaphragm (A) interposed between the beamsplitter and the concave mirror; a third lens group (LG3); the objective defining an image plane and being configured to provide a reduction scale (.beta.) in the range of -0.4 to -0.15 and an image side numerical aperture greater than 0.5. The first and second lens groups (LG1, LG2) are configured to conjointly reduce the sine of the marginal ray angle. The reduction can be up to 40%. Preferably, the second lens group (LG2) can be configured to alone reduce the sine of the marginal ray angle. It is preferable that the sine of the marginal ray angle (sin R.sub.LG1) after the first lens group (LG1) is not less than the sine of the marginal ray angle (sin R.sub.reticle) in the object plane.

REFERENCES:
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5251070 (1993-10-01), Hashimoto et al.
patent: 5402226 (1995-03-01), Matthews et al.
patent: 5402267 (1995-03-01), Furter et al.
"New Approach to Resolution Limit and Advanced Image Formation Techniques in Optical Lithography", H. Fukuda, A. Imai, T. Terasawa and S. Okazaki, IEEE Transaction on Electron Devices, vol. 38, No. 1, Jan. 1991, pp. 67-75 .

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