High resolution electron beam microfabrication process for fabri

Details High resolution electron beam microfabrication process for fabri High resolution electron beam microfabrication process for fabri

1977-01-24

1978-08-22

Smith, John D.

Coating processes

Electrical product produced

Condenser or capacitor

96 36, 29591, 156644, 250492A, 250492B, 357 15, 357 22, 357 52, 427 89, 427 90, 427 96, 427383R, 427 8, H01L 2948

Patent

active

041090292

ABSTRACT:
The specification describes a process for fabricating semiconductor devices and circuits in which lateral geometry dimensions determining the performance level of the device or circuit are extremely small. In this process electron beam microfabrication techniques are used to define these extremely small dimensions. The complete fabrication process uses standard photolithography for the definition of some of the device geometry and mask patterns, and partitioning of pattern definition between electron beam microfabrication and standard photolithography is utilized according to pattern resolution requirements, and is optimized for the highest yield-throughout product.

REFERENCES:
patent: 3609477 (1971-09-01), Drangeid et al.
patent: 3914784 (1975-10-01), Hunsperger et al.
Wolf et al., J. Vac. Sci. Technol. vol. 12, Dec., 1975.

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