High resolution conductor patterning

Details High resolution conductor patterning High resolution conductor patterning

1988-08-29

1990-07-17

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Visible imaging including step of firing or sintering

430311, 430322, 430330, 427 431, 427 531, 21912185, G03C 1100, B05D 306

Patent

active

049421107

ABSTRACT:
A technique for generating high resolution resistor or conductor patterns on uneven surfaces by focusing a CO.sub.2 laser beam to locally render insoluable suitable thick film resistor or conductor material that has been uniformly coated onto a substrate and oven-dried to remove organic coating solvents. Patterns are generated by scanning the laser beam across the coated substrate, and the coating is hardened and adheres to the substrate where it has been exposed by the laser beam.

REFERENCES:
patent: 4061799 (1977-12-01), Brewer
patent: 4063949 (1977-12-01), Uhlig et al.
patent: 4159414 (1979-06-01), Suh et al.
patent: 4454167 (1984-06-01), Bernot et al.
patent: 4467026 (1984-08-01), Ogawa
patent: 4477324 (1984-10-01), Cline
patent: 4814259 (1989-03-01), Newman et al.
"Thick Film Fine Pattern Formation by a Photolithographic Process" by Watanabe, 1979, pp. 27-36.

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