Etching a substrate: processes – Forming or treating an article whose final configuration has...
Patent
1995-04-27
1997-01-07
Powell, William
Etching a substrate: processes
Forming or treating an article whose final configuration has...
216 25, 216 38, 216 56, B44C 122
Patent
active
055913520
ABSTRACT:
The object of the present invention is to provide a cold cathode field emission display whose resolution is not limited by the provision of individual ballast resistors for each pixel or by the wiring system used to deliver voltage to the cold cathodes. This has been achieved by providing additional layers beneath the cold cathodes arrays so that said resistors and voltage delivery systems are located directly below the cold cathode arrays instead of alongside of them. Six different embodiments of the invention are described.
REFERENCES:
patent: 4940916 (1990-07-01), Borel et al.
patent: 5142184 (1992-08-01), Rane
patent: 5194780 (1993-03-01), Meyer
patent: 5229331 (1993-07-01), Doan et al.
patent: 5494179 (1996-02-01), Hori et al.
Industrial Technology Research Institute
Powell William
Saile George O.
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