High resistance polyaniline blend for use in high efficiency...

Details High resistance polyaniline blend for use in high efficiency... High resistance polyaniline blend for use in high efficiency...

2006-04-25

2006-04-25

Truong, Duc (Department: 1711)

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

C428S690000, C428S917000, C528S422000, C528S373000, C528S391000, C525S328500, C525S329400, C525S540000, C525S535000

Reexamination Certificate

active

07033646

ABSTRACT:
Compositions are provided comprising polyaniline (PANI) with poly(2-acrylamido-2-methyl-1-propanesulfonic acid) (PAAMPSA) as the counterion (PANI/PAAMPSA) and an amount of poly(styrenesulfonic acid) (PSS) sufficient to reduce the conductivity of the composition relative to PANI/PAAMPSA. Invention compositions may further comprise poly(acrylamide) (PAM). Invention compositions are useful as high resistance buffer layers for use in electroluminescent devices (such as, organic light emitting diodes (OLEDs)).

REFERENCES:
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Cao, Yong et al., Influence of chemical polymerization conditions on the properties of polyaniline, Polymer, Dec. 1989, 2305-2311, 30, Butterworth & Co. (Publishers) Ltd.
Armes, Steven P. et al., Novel Colloidal Dispersions of Polyaniline, J. Chem. Soc., Chem. Commun., 1989, 88-89.
A. J. Sharpe, Jr. et al., Improved Cationic Conductive Polymer, Calgon Corp., Pittsburgh, PA, Coating Conference [Proceedings], pp. 83-87, 1981, ISSN 0364-2771.

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