Coherent light generators – Particular active media – Semiconductor
Reexamination Certificate
2006-12-12
2006-12-12
Vannucci, James (Department: 2828)
Coherent light generators
Particular active media
Semiconductor
C372S055000
Reexamination Certificate
active
07149234
ABSTRACT:
A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.
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Anderson Stuart L.
Das Palash P.
Geiger Stephan
Hartmann Claudia A.
Partlo William N.
Cray William
Cymer Inc.
Vannucci James
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