High repetition rate excimer laser system

Coherent light generators – Particular active media – Gas

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S029010, C372S032000

Reexamination Certificate

active

06801562

ABSTRACT:

SUMMARY OF THE INVENTION
The invention includes a high repetition rate (repetition rate ≧4 kHz) fluoride excimer laser with magnesium fluoride laser optics for transmitting and controlling the UV &lgr; photons produced by the laser. The magnesium fluoride high repetition rate UV excimer laser optics provide for improved reliability in the operation of ≧4 kHz high repetition rate laser systems. The magnesium fluoride containing high repetition rate laser provides for the production of a high laser power (≧10 mJ) output at a high repetition rate (≧4 kHz) for a long laser system operation time (>500 million pulses, preferably ≧900 million pulses) with a magnesium fluoride laser optics reliability that avoids catastrophic damage of the laser optics and related catastrophic laser system failure. In a preferred embodiment the magnesium fluoride laser optics are utilized in a UV &lgr;<200 nm ArF excimer laser with a 4 kHz repetition rate and an output power of 10 mJ.
The manufacture of semiconductor chips can be achieved using excimer lasers as a light source. Krypton Fluoride lasers with a wavelength of ~248 nm were the first excimer lasers to be used. As the semi-conductor chip technology has evolved, lasers of higher energy and higher repetition rate are required. One such excimer laser is known as Argon Fluoride emitting at ~193 nm. For various applications it is preferable to have such a laser with a repetition rate of 4 kHz. In both Krypton Fluoride lasers and Argon Fluoride lasers, the preferred optical material for windows, beamsplitters, output couplers and line narrowing prisms has been calcium fluoride. At high repetition rates such as 4 kHz it has been observed that the calcium fluoride chamber windows suffer catastrophic damage in a relatively short time scale [less than 500 million pulses for a 4 kHz, 193 nm ArF laser with an output power of 10 mJ.] The damage to the window can be as severe as cracking but at a minimum results in wavefront distortion and increased birefringence. Changing of the windows results in an increased cost of operation of the laser and therefore increased cost of ownership for the chip manufacturer.
Calcium fluoride is a cubic material, optically isotropic with excellent transmission in the VUV, UV, visible and IR parts of the spectrum. When calcium fluoride is illuminated with 193 nm laser light, the material emits photons in the near UV. The observed fluorescence in turn means energy is being absorbed. As the band gap of calcium fluoride is much larger than the energy of the laser photons it is surmised that there is a multi-photon absorption process. It is proposed that the center created by multi-photon absorption can itself absorb further photons and this can lead to heating and consequently material degradation. If the lifetime of the absorption center is sufficiently long then at 4 kHz heating can occur whereas at lower repetition rates, heating may not be observed.
Magnesium fluoride is a tetragonal material and therefore optically anisotropic. As such it has not been a favored material for lithographic lasers because of the importance of polarization within the manufacturing process. Magnesium fluoride has a wider bandgap and a lower quench temperature for self trapped excitonic emission.
The invention includes a ≧4 kHz repetition rate argon fluoride excimer laser system for producing an UV wavelength 193 nm output. The ≧4 kHz repetition rate argon fluoride excimer laser system includes an argon fluoride excimer laser chamber for producing a 193 nm discharge at a pulse repetition rate ≧4 kHz. The ≧4 kHz repetition rate argon fluoride excimer laser chamber includes at least one magnesium fluoride crystal optic window for outputting the 193 nm discharge as a 4 kHz repetition rate excimer laser 193 nm output with the magnesium fluoride crystal optic window having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30%. That is, the invention includes a ≧4 kHz repetition rate argon fluoride excimer laser system in which the laser chamber has at least one window made from a single crystal of magnesium fluoride, and such window, after exposure to 5 million pulses of 193 nm light having a fluence of 40 mJ/cm
2
/pulse, has an absorbance of less than 0.08 Abs per 42 mm path length when measured at 255 nm and a 120 nm transmission of at least 30% through a 42 mm path.
The invention includes a ≧4 kHz repetition rate excimer laser system for producing an UV wavelength &lgr;<200 nm output. The ≧4 kHz repetition rate excimer laser system for producing an UV wavelength &lgr;<200 nm output includes
an excimer laser chamber for producing an UV wavelength &lgr;<200 nm discharge at a pulse repetition rate ≧4 kHz. The excimer laser chamber includes at least one magnesium fluoride crystal optic window for outputting the &lgr;<200 nm discharge as a ≧4 kHz repetition rate excimer laser &lgr;<200 nm output with the magnesium fluoride crystal optic window having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a 200 to 210 nm range absorption coefficient <0.0017 cm
−1
.
The invention includes a ≧4 kHz repetition rate fluoride excimer laser magnesium fluoride crystal optic for transmitting a ≧4 kHz repetition rate fluoride excimer UV wavelength &lgr;<200 nm output. The ≧4 kHz repetition rate fluoride excimer laser magnesium fluoride crystal has a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30%.
The invention includes a ≧4 kHz repetition rate fluoride excimer laser magnesium fluoride crystal optic window for transmitting a ≧4 kHz repetition rate fluoride excimer UV wavelength &lgr;<200 nm output. The ≧4 kHz repetition rate fluoride excimer laser crystal optic window is comprised of a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a 200 to 210 nm range absorption coefficient <0.0017 cm
−1
.
The invention includes a ≧4 kHz repetition rate argon fluoride excimer laser crystal optic for transmitting an UV wavelength 193 nm argon fluoride excimer laser ≧4 kHz repetition rate output with the laser crystal optic comprised of a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence >40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30%.
The invention includes a &lgr;<200 nm optical fluoride crystal for transmitting a UV wavelength &lgr;<200 nm with the &lgr;<200 nm optical fluoride crystal comprised of a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm
2
/pulse and a 42 mm crystal 120 nm transmission of at least 30%, and a Fe contamination level less than 0.17 ppm Fe by weight, a chrome contamination level less than 00.08 ppm chrome by weight, a copper contamination level less than 0.04 ppm copper by weight, a cobalt contamination level less than 0.04 ppm cobalt by weight, an Al contamination level less than 0.9 ppm Al by weight, a nickel contamination level less than 0.04 ppm nickel by weight, a vanadium contamination level less than 0.04 ppm vanadium by weight, and a lead contamination level less than 0.04 ppm lead by weight and a 200 to 210 nm range absorption coefficient <0.0017 cm
−1
. Preferably the Fe contamination level is less than 0.15 ppm Fe by weight, the chrome contamination level is less than 0.06 pp

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High repetition rate excimer laser system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High repetition rate excimer laser system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High repetition rate excimer laser system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3286712

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.