Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Reexamination Certificate
2006-04-07
2008-09-02
Soward, Ida M (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
With means to control surface effects
Insulating coating
C257S636000, C257S638000, C257S639000
Reexamination Certificate
active
07420264
ABSTRACT:
An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).
REFERENCES:
patent: 4963012 (1990-10-01), Tracy et al.
patent: 5505989 (1996-04-01), Jenkinson
patent: 5574744 (1996-11-01), Gaw et al.
patent: 5589233 (1996-12-01), Law et al.
patent: 5619059 (1997-04-01), Li et al.
patent: 5745291 (1998-04-01), Jenkinson
patent: 5767507 (1998-06-01), Unlu et al.
patent: 5786068 (1998-07-01), Dorfman et al.
patent: 5891556 (1999-04-01), Anderson et al.
patent: 5998298 (1999-12-01), Fleming et al.
patent: 6013980 (2000-01-01), Goel et al.
patent: 6078425 (2000-06-01), Wolfe et al.
patent: 6233087 (2001-05-01), Hawkins et al.
patent: 6322881 (2001-11-01), Boire et al.
patent: 6441359 (2002-08-01), Cozier et al.
patent: 6461731 (2002-10-01), Veerasamy et al.
patent: 6486597 (2002-11-01), Goel et al.
patent: 6495251 (2002-12-01), Arbab et al.
patent: 6506469 (2003-01-01), Takahashi et al.
patent: 6587263 (2003-07-01), Iacovangelo et al.
patent: 6672922 (2004-01-01), Shirakawa et al.
patent: 6730352 (2004-05-01), Stachowiak
patent: 6734469 (2004-05-01), Yano et al.
patent: 6800322 (2004-10-01), Takeishi et al.
patent: 7049004 (2006-05-01), Domash et al.
patent: 7070987 (2006-07-01), Cunningham et al.
patent: 7351993 (2008-04-01), Atanackovic
patent: 2002/0159172 (2002-10-01), Kozhukh
patent: 2003/0210880 (2003-11-01), Johnson et al.
patent: 2006/0078746 (2006-04-01), Neuman et al.
Blakely , Sokoloff, Taylor & Zafman LLP
Soward Ida M
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