High reflector tunable stress coating, such as for a MEMS...

Details High reflector tunable stress coating, such as for a MEMS... High reflector tunable stress coating, such as for a MEMS...

2006-06-06

2006-06-06

Soward, Ida M. (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

With means to control surface effects

Insulating coating

C257S010000, C257S227000, C257S292000, C257S293000, C257S294000, C257S411000, C257S414000, C257S432000, C257S439000, C257S639000, C257S649000, C257S760000, C257SE31110

Reexamination Certificate

active

07057262

ABSTRACT:
An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

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