High rate sputtering of exhaust oxygen sensor electrode

Details High rate sputtering of exhaust oxygen sensor electrode High rate sputtering of exhaust oxygen sensor electrode

1984-06-28

1985-06-04

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192S, 204192C, 204427, C23C 1500

Patent

active

045212872

ABSTRACT:
A method of sputtering a platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor. Porous high surface area films are consistently deposited at high rates. A DC magnetron cathode assembly having a magnetic field strength of at least 500 gauss across its target face is used at a sputtering power of about 4-9 kilowatts. A thimble-target spacing of less than about 3.0 cm, a pressure less than about 10 millitorr, a sputtering atmosphere consisting essentially of more than about 50 percent nitrogen and/or oxygen, an electrically isolated deposition surface, and an electrically floating reference electrode precoated on the zirconia thimble surface are used.

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