High rate magnetron sputtering of high permeability materials

Details High rate magnetron sputtering of high permeability materials High rate magnetron sputtering of high permeability materials

1983-06-29

1984-02-14

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192M, C23C 1500

Patent

active

044315058

ABSTRACT:
A magnetron sputtering apparatus for high permeable materials where the target may include first and second elements separated from one another by a gap and the magnetic field source preferably exceeds 1000 gauss adjacent a pole thereof. The source is preferably a solid, oriented crystal ferrite magnet. A number of different configurations are disclosed.

REFERENCES:
patent: 4265729 (1981-05-01), Morrison
patent: 4282083 (1981-08-01), Kertesz et al.
patent: 4356073 (1982-10-01), McKelvey
patent: 4361472 (1982-11-01), Morrison
patent: 4370217 (1983-01-01), Funaki
patent: 4391697 (1983-07-01), Morrison et al.
patent: 4394236 (1983-07-01), Robinson
patent: 4394245 (1983-07-01), Homma et al.

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