High rate deposition of titanium dioxide

Details High rate deposition of titanium dioxide High rate deposition of titanium dioxide

2005-05-10

2005-05-10

Jones, Deborah (Department: 1775)

Stock material or miscellaneous articles

Composite

Of polycarbonate

C428S689000, C428S701000, C428S702000, C428S220000

Reexamination Certificate

active

06890656

ABSTRACT:
There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate.

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PCT Search Report dated Jun. 8, 2004.
Seung-Min Oh et al., “Production of Ultrafine Titanium Dioxide By DC Plasma Jet”, Thin Solid Films, Elsevier, vol. 386, pp. 233-238, 2001.

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