Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Reexamination Certificate
2005-10-19
2008-08-26
Hiteshew, Felisa (Department: 1792)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
C117S030000, C117S032000, C117S217000
Reexamination Certificate
active
07416603
ABSTRACT:
Disclosed is a method of growing a single crystal from a melt contained in a crucible. The method includes the step of making the temperature of a melt increase gradually to a maximum point and then decrease gradually along the axis parallel to the lengthwise direction of the single crystal from the interface of the single crystal and the melt to the bottom of the crucible. The increasing temperature of the melt is kept to preferably have a greater temperature gradient than the decreasing temperature thereof. Preferably, the axis is set to pass through the center of the single crystal. Preferably, the convection of the inner region of the melt is made smaller than that of the outer region thereof.
REFERENCES:
patent: 5938836 (1999-08-01), Tomioka et al.
patent: 6592662 (2003-07-01), Fusegawa et al.
Grossman Tucker Perreault & Pfleger PLLC
Hiteshew Felisa
Siltron Inc.
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