High quality antialiased lines with dual sampling pattern

Computer graphics processing and selective visual display system – Computer graphics processing – Attributes

Reexamination Certificate

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Details

C345S443000, C345S613000, C382S268000, C382S269000

Reexamination Certificate

active

10086986

ABSTRACT:
Antialiased lines are classified according to their orientation, e.g. as x-major or y-major depending whether the x or y extent of the line is larger. Different subpixel sampling patterns are used for different lines, in accordance with this classification. This permits antialiased rendering to achieve increased visual quality of the line without adding in more sample points.

REFERENCES:
patent: 5305432 (1994-04-01), Kubota
patent: 5487142 (1996-01-01), Nakayama et al.
patent: 5815162 (1998-09-01), Levine
patent: 6172680 (2001-01-01), Wong et al.
patent: 6344852 (2002-02-01), Zhu
patent: 6437793 (2002-08-01), Kaasila
patent: 6501483 (2002-12-01), Wong et al.
patent: 6791569 (2004-09-01), Millet et al.
patent: 6947057 (2005-09-01), Nelson et al.
patent: 7136081 (2006-11-01), Gritz et al.

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