High purity phosphoric acid and process of producing the same

Details High purity phosphoric acid and process of producing the same High purity phosphoric acid and process of producing the same

2004-06-28

2008-12-30

Langel, Wayne A. (Department: 1754)

Chemistry of inorganic compounds

Phosphorus or compound thereof

Oxygen containing

C423S321100

Reexamination Certificate

active

07470414

ABSTRACT:
High purity phosphoric acid having an Sb content of 200 ppb or less and a sulfide ion content of 200 ppb or less as impurity contents on a 85 weight percent H3PO4basis. The high purity phosphoric acid is useful as an etching solution for semiconductor devices having a silicon nitride film, an etching solution for liquid crystal display panels having an alumina film, a metallic aluminum etching solution, an alumina etching solution for ceramics, a raw material of phosphate glass for optical fiber, a food additive, and so forth. A metallic material having low capability of forming a lithium compound penetrates through the whole thickness of the active material layer5.

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