Organic compounds -- part of the class 532-570 series – Organic compounds – Rare earth containing
Reexamination Certificate
2005-08-16
2005-08-16
Jones, Dameron L. (Department: 1616)
Organic compounds -- part of the class 532-570 series
Organic compounds
Rare earth containing
C502S150000, C502S160000
Reexamination Certificate
active
06930177
ABSTRACT:
The invention provides true La(OiPr)3preferable as a starting material for an asymmetric synthesis catalyst and a process for producing the same. In this process, anhydrous lanthanum chloride LaCl3is reacted with potassium isopropoxide K(OiPr) in a mixed solvent of isopropanol and toluene, then the isopropanol is distilled away to replace all the solvent by toluene, then the reaction solution is left, decanted and filtered to give a transparent filtrate, and the solvent is distilled away from the filtrate which is then vacuum-dried under heating, whereby high-purity La(OiPr)3is obtained in 77% yield. In this high-purity La(OiPr)3, the La content is 97 to 103% of the theoretical content, impurity K is 0.3% or less, (Li+Na) is 0.01% or less, Cl is 0.2% or less, and the degree of association thereof is 5.5 to 6.5.
REFERENCES:
patent: 5024991 (1991-06-01), Tsunashima et al.
Brown et al (1970), Inorganic Chemistry, vol. 9, No. 12, pp. 2783-2786.
Brown et al (Inorganic Chemistry, 1970, vol. 9, No. 12, pp. 2783-2786).
Ishii Tadashi
Kadokura Hidekimi
Kuboshima Yoshinori
Matsumoto Hiroshi
Matsumoto Masamichi
Fattibene Arthur T.
Fattibene Paul A.
Fattibene & Fattibene
Jones Dameron L.
Kabushikikaisha Kojundokagaku Kenkyusho
LandOfFree
High-purity lanthanum isoproxide and a process for producing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High-purity lanthanum isoproxide and a process for producing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-purity lanthanum isoproxide and a process for producing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3494989