High purity hydroxy-terminated phenyl ladder polysiloxane and me

Details High purity hydroxy-terminated phenyl ladder polysiloxane and me High purity hydroxy-terminated phenyl ladder polysiloxane and me

1990-11-29

1993-01-12

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 43, C08G 7702

Patent

active

051791854

ABSTRACT:
High purity hydroxy-terminated phenyl and alkenyl substituted ladder polysiloxane, which contains therein 1 ppm or below of each of sodium, potassium, iron, copper, lead and chloride, and 1 ppb or below of each of uranium and thorium, and is represented by the following general formula (I): ##STR1## where: R.sub.1 is phenyl and R.sub.2 is an alkenyl group; n is an integer of from 7 to 1600; m and l are natural numbers satisfying relationships of 2n=m+l and l/m+l.gtoreq.0.02.
The high purity hydroxy-terminated ladder polysiloxane contains photosensitive groups in its side chain and is useful as a protective film and as an interlayer insulating film in the production of semiconductor elements.

REFERENCES:
patent: 5081202 (1992-01-01), Adachi et al.
Chemical Abstracts, vol. 84 No. 4, Jan. 26, 1976 Columbus, Ohio, abstract No. 17970Y, Andrianov, et al. Poly(vinylphenylsilsequioxane) p. 19, column R.
Patent abstracts of Japan vol. 13 No. 302 (C-616)(3650) Jul. 12, 1989; High Purity Phenylsilicone Ladder Polymer and Production and Thereof; JP 1-092,224, Apr. 11, 1989.
Polymer Preprinte, Japan, vol. 30, No. 1, p. 212, 1981, A Hirao, et al., "Synthesis of Soluble Polysilsesquioxanes Having Functional Groups".
Journal of Japan Chemical Society, 1974, (1), pp.108-111.

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