High purity ferromagnetic sputter target, assembly and...

Metal working – Method of mechanical manufacture – Shaping one-piece blank by removing material

Reexamination Certificate

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Details

C029S459000, C029S527100, C204S192120, C204S298160, C204S298370

Reexamination Certificate

active

06988306

ABSTRACT:
Provided is a method of forming ferromagnetic sputter targets and sputter target assemblies having a uniform distribution of magnetic leakage flux. The method includes providing a ferromagnetic sputter workpiece and hot rolling the workpiece to a substantially circular configuration sputter target; machining a taper in a surface of the sputter target to have a thickness gradient of the sputter target, where the center of the sputter target is about 0.020 to about 0.005 inches thinner than the edge of the sputter target, and where the magnetic leakage flux across the sputter target is uniformly distributed.

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patent: 6073830 (2000-06-01), Hunt et al.
patent: 799905 (1997-10-01), None

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