High purity diffusion furnace components

Details High purity diffusion furnace components High purity diffusion furnace components

1989-04-18

1991-03-12

Bennett, Henry A.

Heating

Accessory means for holding, shielding or supporting work...

432239, F27D 500

Patent

active

049988794

ABSTRACT:
Components for semiconductor diffusion furnaces are constructed of a high purity impervious silicon carbide or silicon nitride matrix deposited on a pre-shaped fibrous matrix of silicon carbide, carbon, or carbon coated silicon carbide. The high purity of the matrix prevents undesired gaseous components from contaminating the atmosphere of the furnace, and the fibrous re-enforcement provides strength combined with light weight.

REFERENCES:
patent: 3951587 (1976-04-01), Alliegro et al.
patent: 4713275 (1987-12-01), Riccitiello et al.
patent: 4761134 (1988-08-01), Foster
patent: 4766013 (1988-08-01), Warren

Affiliated with

Also associated with

Rating

High purity diffusion furnace components does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High purity diffusion furnace components, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High purity diffusion furnace components will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-445367