High-purity cleaning system, method, and apparatus

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment

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134 10, 134 21, 134 2219, 134 254, 134 26, 134 37, 134 42, B08B 500

Patent

active

049369229

ABSTRACT:
A system for high purity cleaning of components includes a cleaning chamber which is maintained at a pressure above ambient atmospheric pressure. A gas-glide transporter extends through the cleaning chamber and includes a pair of slightly tilted elongate tubes having a plurality of tiny holes therein. The tubes communicate with a source of filtered pressurized nitrogen. A tray for carrying components to be cleaned is adapted to fit on the tubes and slide down the transporter on a frictionless cushion of nitrogen. Components are cleaned of very small particles by using a high pressure spray of individual droplets of solvent which knock the particles off the component to be cleaned. The particles, solvent and solvent vapor are swept away from the component being cleaned by a stream of dry, filtered air. Two types of solvent systems are shown. One supplies liquid solvent under high pressure to the solvent sprayer while the other uses liquid solvent and a compressed gas under high pressure as a propellant to force the solvent through the small orifice of the sprayer. The cleaning chamber group includes a control panel which controls solvent supply and recovery modules. The cleaning chamber group is modular so that it may be placed in a Class 100 environment.

REFERENCES:
patent: 4443269 (1984-04-01), Capella et al.
patent: 4606774 (1986-08-01), Morris
patent: 4832753 (1989-05-01), Cherry et al.

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