High purity chromium metal by casting with controlled oxygen con

Details High purity chromium metal by casting with controlled oxygen con High purity chromium metal by casting with controlled oxygen con

1997-03-24

1999-02-02

Phipps, Margery

Alloys or metallic compositions

Chromium base

148407, 148423, 75623, C22C 2706, C22B 3432

Patent

active

058660674

ABSTRACT:
The present invention relates to high purity chromium metal suitable for deposition onto a semiconductor wafer or other substrate by sputtering. The high purity chromium metal is produced by a process that increases productivity, expands melting capability and provides consistent high purity chromium by reducing contamination by the dissolution of crucible material. The present invention provides high purity chromium by the addition of chromium oxide (Cr.sub.2 O.sub.3) to molten chromium to control oxygen content in the chromium thereby producing high purity chromium ingots and protecting the ceramic crucibles from chemical attach by the liquid chromium.

REFERENCES:
patent: 3640700 (1972-02-01), Suzuki et al.
patent: 4504310 (1985-03-01), Boulier
patent: 5092921 (1992-03-01), Kobayashi et al.
patent: 5259866 (1993-11-01), Kobayashi et al.
patent: 5476548 (1995-12-01), Kobayashi et al.
WPIDS Abstract 79-19122B of JP 54-113;408, 1979.
WPIDS Abstract 88-274, 362 of JP 63-199, 832, 1988.

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