High purification method of jig for semiconductor heat...

Details High purification method of jig for semiconductor heat... High purification method of jig for semiconductor heat...

2005-08-05

2009-10-13

Carrillo, Sharidan (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including work heating or contact with combustion products

C134S002000, C134S003000, C134S021000, C134S026000, C134S028000, C134S034000, C134S036000, C134S041000, C134S042000

Reexamination Certificate

active

07601227

ABSTRACT:
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon carbide film grown by chemical vapor deposition or a semiconductor heat treatment jig made of a silicon carbide film grown by chemical vapor deposition to high-temperature oxidation heat treatment so as to form an oxide film on a surface of the silicon carbide film, and removing the oxide film.

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Translation of JP-11016993.
Japanese Office Action. dated Apr. 24 2009. For Appln. No. 2004-032602.

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