High pressure separation process

Chemistry of hydrocarbon compounds – Purification – separation – or recovery

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C07C 700

Patent

active

047958545

ABSTRACT:
A device for separating a high pressure polyphase mixture consisting of a gas charged with liquid particles, and particularly a mixture of ethylene and polyethylene, which comprises a cylindrical vertical enclosure into which extends an inlet means for supplying the mixture thereto and which is provided at its lower end with an outlet for discharging separated liquids; a vertical cyclone in communication with the enclosure for receiving separated gases therefrom and having an outlet at its upper end for discharging gases separated in the cyclone and a liquid outlet at its lower end for discharging separated liquids therefrom; and an ejector comprising a nozzle, through which the polyphase mixture is fed, a mixing zone connected to the liquid outlet of the cyclone and a diffuser section for reducing the speed of the resultant mixture and being connected to the inlet means for supplying the polyphase mixture to the enclosure.

REFERENCES:
patent: Re20931 (1938-11-01), Ruthruff
patent: 1940227 (1933-12-01), Plummer
patent: 2353119 (1944-07-01), Workman
patent: 4070250 (1978-01-01), Choi
patent: 4087602 (1978-05-01), Mietzner et al.
patent: 4093795 (1978-06-01), Buechner et al.
patent: 4151044 (1979-04-01), Choi
patent: 4289512 (1981-09-01), Levresse

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High pressure separation process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High pressure separation process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High pressure separation process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2169515

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.