High pressure processing method

Cleaning and liquid contact with solids – Processes – With work or work parts movable during treatment

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S034000

Reexamination Certificate

active

11249444

ABSTRACT:
A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

REFERENCES:
patent: 4197000 (1980-04-01), Blackwood
patent: 5037506 (1991-08-01), Gupta et al.
patent: 5226242 (1993-07-01), Schwenkler
patent: 5238773 (1993-08-01), Babich et al.
patent: 5279921 (1994-01-01), Onishi et al.
patent: 5286599 (1994-02-01), Babich et al.
patent: 5457005 (1995-10-01), Babich et al.
patent: 5707487 (1998-01-01), Hori et al.
patent: 5718763 (1998-02-01), Tateyama et al.
patent: 5763016 (1998-06-01), Levenson et al.
patent: 5783367 (1998-07-01), Maruyama et al.
patent: 5881750 (1999-03-01), Yoshitani
patent: 5908510 (1999-06-01), McCullough et al.
patent: 5954911 (1999-09-01), Bergman et al.
patent: 6033134 (2000-03-01), Maruyama et al.
patent: 6056026 (2000-05-01), Fosnight et al.
patent: 6199604 (2001-03-01), Miyajima
patent: 6276378 (2001-08-01), Taniyama et al.
patent: 6629539 (2003-10-01), Yanagita et al.
patent: 6660460 (2003-12-01), Sahbari
patent: 59-161826 (1984-09-01), None
patent: 60-187303 (1985-09-01), None
patent: 60-192333 (1985-09-01), None
patent: 63-221803 (1988-09-01), None
patent: 64-45125 (1989-02-01), None
patent: 5-326472 (1993-12-01), None
patent: 10-125644 (1998-05-01), None
patent: 11-87306 (1999-03-01), None
patent: 2000-340540 (2000-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High pressure processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High pressure processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High pressure processing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3900126

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.