Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Positive pressure type
Reexamination Certificate
2004-10-04
2008-10-14
Leung, Jennifer A (Department: 1797)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Positive pressure type
C422S105000, C422S117000, C134S902000
Reexamination Certificate
active
07435396
ABSTRACT:
Mixing baths6A and6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths6A and6B are each connected with a high-pressure fluid supplying unit2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit2to the mixing bath6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve)39is opened, the processing fluid is sent into a pressure vessel1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel1, using the processing fluid.
REFERENCES:
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5470393 (1995-11-01), Fukazawa
patent: 5772783 (1998-06-01), Stucker
patent: 6107215 (2000-08-01), Fujimura et al.
patent: 6306564 (2001-10-01), Mullee
patent: 6712081 (2004-03-01), Uehara et al.
patent: 6874513 (2005-04-01), Yamagata et al.
patent: 2002/0148492 (2002-10-01), Yamagata et al.
patent: 2003/0232512 (2003-12-01), Dickinson et al.
patent: 4-346035 (1992-12-01), None
patent: 10-303164 (1998-11-01), None
patent: 10-326771 (1998-12-01), None
patent: 2000-58492 (2000-02-01), None
patent: 2001-77074 (2001-03-01), None
patent: 2002-313764 (2002-10-01), None
patent: 2002-353185 (2002-12-01), None
patent: 2003-31533 (2003-01-01), None
patent: 03/041131 (2003-05-01), None
Japanese Office Action issued Jun. 3, 2008 in corresponding Japanese application No. 2003-352168.
Inoue Yoichi
Iwata Tomomi
Muraoka Yusuke
Oshiba Hisanori
Saito Kimitsugu
Dainippon Screen Mfg. Co,. Ltd.
Leung Jennifer A
Ostrolenk Faber Gerb & Soffen, LLP
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